Jinghong Sun, Yazheng Liu, and Leyu Zhou, Simulation of annealing process effect on texture evolution of deep-drawing sheet Stl5, J. Univ. Sci. Technol. Beijing, 12(2005), No. 6, pp. 512-516.
Cite this article as:
Jinghong Sun, Yazheng Liu, and Leyu Zhou, Simulation of annealing process effect on texture evolution of deep-drawing sheet Stl5, J. Univ. Sci. Technol. Beijing, 12(2005), No. 6, pp. 512-516.
Jinghong Sun, Yazheng Liu, and Leyu Zhou, Simulation of annealing process effect on texture evolution of deep-drawing sheet Stl5, J. Univ. Sci. Technol. Beijing, 12(2005), No. 6, pp. 512-516.
Citation:
Jinghong Sun, Yazheng Liu, and Leyu Zhou, Simulation of annealing process effect on texture evolution of deep-drawing sheet Stl5, J. Univ. Sci. Technol. Beijing, 12(2005), No. 6, pp. 512-516.
A two-dimensional cellular automaton method was used to simulate grain growth during the recrystallization annealing of deep-drawing sheet Stl5, taking the simulated result of recrystallization and the experimental result of the annealing texture of deepdrawing sheet St15 as the initial condition and reference. By means of computer simulation, the microstructures and textures of different periods of grain growth were predicted. It is achieved that the grain size, shape and texture become stable after the grain growth at a constant temperature of 700°C for 10 h, and the advantaged texture components {111 }<110> and {111 }<112> are dominant.
A two-dimensional cellular automaton method was used to simulate grain growth during the recrystallization annealing of deep-drawing sheet Stl5, taking the simulated result of recrystallization and the experimental result of the annealing texture of deepdrawing sheet St15 as the initial condition and reference. By means of computer simulation, the microstructures and textures of different periods of grain growth were predicted. It is achieved that the grain size, shape and texture become stable after the grain growth at a constant temperature of 700°C for 10 h, and the advantaged texture components {111 }<110> and {111 }<112> are dominant.