Ti1－xAlxN PVD薄层的微结构特征和氧化行为

马中庭; 倪瑞明

Volume 2 Issue 1

Mar. 1995

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文章导航 > 矿物冶金与材料学报（英文） > 1995 > 2(1): 44-49

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

Cite this article as:

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

Citation:

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

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Ti_1－xAl_xN PVD薄层的微结构特征和氧化行为

北京科技大学物理化学系

中文摘要

本文总结了关于Ti_1-xAl_xN薄层的微结构特征和氧化行为的最新研究成果。Ti_1-xAl_xN薄层含有3个不同的相区：x值较小时，其微结构为立方晶系；x值较大时，其微结构为六方晶系；x为中间值时，其结构尚不清楚。应用选择性氧化机理，预测了具有不同Ti/Al比值的Ti_1-xAl_xN薄层的氧化结果。

关键词:

MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS

MA ZHONGTING and
NI RUIMING

+ Author Affiliations

Abstract

Abstract

Recent research on microstructural characteristics and oxidation behavior of Ti_1-xAl_xN thin film were surveyed. The Ti_1-xAl_xN coatings have three different phase regions, Bl structure for lower x value, wurtzite structure for higher x value and unidentified structure for medium x value. Based upon the selective oxidation mechanism the oxidation results of Ti_1-xAl_xN thin film with different Ti/Al ratio were predicated.
- crystal system;
- oxidation/TiAlN coatings;
- microstructural characteristic