Guanghua Yu, Chunlin Chai, Fengwu Zhu, Jimei Xiao,  and Wuyan Lai, XPS Studies of Chemical States of NiO/NiFe Interface, J. Univ. Sci. Technol. Beijing, 8(2001), No. 4, pp. 270-273.
Cite this article as:
Guanghua Yu, Chunlin Chai, Fengwu Zhu, Jimei Xiao,  and Wuyan Lai, XPS Studies of Chemical States of NiO/NiFe Interface, J. Univ. Sci. Technol. Beijing, 8(2001), No. 4, pp. 270-273.
Materials

XPS Studies of Chemical States of NiO/NiFe Interface

+ Author Affiliations
  • Received: 12 February 2001
  • Ta/NTiO/NiFe/Ta multilayers were prepared by radio frequency reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 9.6 × 103 A/m. The compositions and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique, The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni + FeO and 3NiO+2Fe =3 Ni+Fe2O3. The thickness of the chemical reaction area estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products appear magnetic defects, and the exchange coupling field Hex and the coereivity Hc of NiO/NiFe are affected by these defects.
  • loading
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索

    Share Article

    Article Metrics

    Article Views(297) PDF Downloads(20) Cited by()
    Proportional views

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return