A probable new phase H(Ni2Ti9Si9) in Ti-Ni-Si ternary system at 1100 ℃

HU Xiaohua; CHEN Guoliang; NI Kequan

Volume 4 Issue 3

Sep. 1997

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Article Navigation > International Journal of Minerals, Metallurgy and Materials > 1997 > 4(3): 5-7

HU Xiaohua, CHEN Guoliang, and NI Kequan, A probable new phase H(Ni₂Ti₉Si₉) in Ti-Ni-Si ternary system at 1100 ℃, J. Univ. Sci. Technol. Beijing, 4(1997), No. 3, pp. 5-7.

Cite this article as:

HU Xiaohua, CHEN Guoliang, and NI Kequan, A probable new phase H(Ni₂Ti₉Si₉) in Ti-Ni-Si ternary system at 1100 ℃, J. Univ. Sci. Technol. Beijing, 4(1997), No. 3, pp. 5-7.

HU Xiaohua, CHEN Guoliang, and NI Kequan, A probable new phase H(Ni2Ti9Si9) in Ti-Ni-Si ternary system at 1100 ℃, J. Univ. Sci. Technol. Beijing, 4(1997), No. 3, pp. 5-7.

Citation:

HU Xiaohua, CHEN Guoliang, and NI Kequan, A probable new phase H(Ni₂Ti₉Si₉) in Ti-Ni-Si ternary system at 1100 ℃, J. Univ. Sci. Technol. Beijing, 4(1997), No. 3, pp. 5-7.

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A probable new phase H(Ni₂Ti₉Si₉) in Ti-Ni-Si ternary system at 1100 ℃

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Received: 20 June 1996

Abstract

Abstract

A probable new phase was detected in Ni-Ti-Si temary system at 1 100 ℃. Its composition is around Ni:Ti:Si = 10:45:45 (atom fraction) according to the results of EPMA (Electron Probe Microanalysis) of 4 alloy scontaining the Phase. The SEM microstructure difference of the 4 alloys can give some proof of its existence.
- new phase;
- H（Ni₂Ti₉Si₉） phase;
- microstructure;
- chemical composition