Guanghua Yu, Haifeng Li, Tao Yang, and Fengwu Zhu, Magnetic properties and structure of very thin permalloy films, J. Univ. Sci. Technol. Beijing, 11(2004), No. 3, pp. 225-229.
Cite this article as:
Guanghua Yu, Haifeng Li, Tao Yang, and Fengwu Zhu, Magnetic properties and structure of very thin permalloy films, J. Univ. Sci. Technol. Beijing, 11(2004), No. 3, pp. 225-229.
Guanghua Yu, Haifeng Li, Tao Yang, and Fengwu Zhu, Magnetic properties and structure of very thin permalloy films, J. Univ. Sci. Technol. Beijing, 11(2004), No. 3, pp. 225-229.
Citation:
Guanghua Yu, Haifeng Li, Tao Yang, and Fengwu Zhu, Magnetic properties and structure of very thin permalloy films, J. Univ. Sci. Technol. Beijing, 11(2004), No. 3, pp. 225-229.
In order to study the magnetic properties and structure of very thin permalloy films, Ni81Fe19 films of 12 nm in thickness were prepared by different instruments at an ultrahigh base vacuum and a lower base vacuum. The anisotropic magnetoresistance coefficients (△R/R) of Ni81Fe19 (12 nm) films reached 1.6 % and 0.6 %, and the coercivities were 127 and 334 A/m, respectively. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to study the structure and surface chemical state. The experimental results show that the films prepared at the ultrahigh base vacuum have a smoother surface, a bigger grain size and a denser structure with fewer defects than those prepared at the lower base vacuum.