摘要:
To explore the reaction behavior of trace oxygen during the flash combustion process of falling FeSi75 powder in a nitrogen flow, a flash-combustion-synthesized Fe-Si
3N
4 sample was heat-treated to remove SiO
2. The samples before and after the treatment were investigated by X-ray diffraction, scanning electron microscopy, and transmission electron microscopy, and the formation mechanism of SiO
2 was investigated. The results show that SiO
2 in the Fe-Si
3N
4 is mainly located on the surface or around the Si
3N
4 particles in dense areas, existing in both crystalline and amorphous states; when the FeSi75 particles, which are less than 0.074 mm in size, fell in up-flowing hot N
2 stream, trace oxygen in the N
2 stream did not significantly hinder the nitridation of FeSi75 particles as it was consumed by the surface oxidation of the generated Si
3N
4 particles to form SiO
2. At the reaction zone, the oxidation of Si
3N
4 particles decreased the oxygen partial pressure in the N
2 stream and greatly reduced the opportunity for FeSi75 particles to be oxidized into SiO
2; by virtue of the SiO
2 film developed on the surface, the Si
3N
4 particles adhered to each other and formed dense areas in the material.