Abstract: Lithography is a pivotal micro/nanomanufacturing technique, facilitating performance enhancements in an extensive array of devices, encompassing sensors, transistors, and photovoltaic devices. The key to creating highly precise, multiscale-distributed patterned structures is the precise control of the lithography process. Herein, high-quality patterned ZnO nanostructures are constructed by systematically tuning the exposure and development times during lithography. By optimizing these parameters, ZnO nanorod arrays with line/hole arrangements are successfully prepared. Patterned ZnO nanostructures with highly controllable morphology and structure possess discrete three-dimensional space structure, enlarged surface area, and improved light capture ability, which achieve highly efficient energy conversion in perovskite solar cells. The lithography process management for these patterned ZnO nanostructures provides important guidance for the design and construction of complex nanostructures and devices with excellent performance.