Fabrication and properties of ZAO powder,sputtering target materials and the related films

Wei Shao, Ruixin Ma, Bin Liu

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    Wei Shao, Ruixin Ma, and Bin Liu, Fabrication and properties of ZAO powder,sputtering target materials and the related films, J. Univ. Sci. Technol. Beijing , 13(2006), No. 4, pp.346-349. https://dx.doi.org/10.1016/S1005-8850(06)60071-6
    Wei Shao, Ruixin Ma, and Bin Liu, Fabrication and properties of ZAO powder,sputtering target materials and the related films, J. Univ. Sci. Technol. Beijing , 13(2006), No. 4, pp.346-349. https://dx.doi.org/10.1016/S1005-8850(06)60071-6
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    Fabrication and properties of ZAO powder,sputtering target materials and the related films

    • Metallurgical and Ecological Engineering School, University of Science and Technology Beijing, Beijing 100083, China

      通信作者:

      Ruixin Ma E-mail: maruixin@metall.ustb.edu.cn

    中文摘要

    Aluminum-doped zinc oxide (ZnO:Al), abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target materials were fabricated by sintering in air, and ZAO transparent conductive films were prepared by RF magnetron sputtering on glass substrates. XRD proved that such films had an orientation of (002) crystal panel paralleled to the surface of the glass substrate. The average transmittance of the films in the visible region exceeded 80%.

     

    Materials

    Fabrication and properties of ZAO powder,sputtering target materials and the related films

    Author Affilications

      • Metallurgical and Ecological Engineering School, University of Science and Technology Beijing, Beijing 100083, China

    • Received: 19 September 2005;
    Aluminum-doped zinc oxide (ZnO:Al), abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target materials were fabricated by sintering in air, and ZAO transparent conductive films were prepared by RF magnetron sputtering on glass substrates. XRD proved that such films had an orientation of (002) crystal panel paralleled to the surface of the glass substrate. The average transmittance of the films in the visible region exceeded 80%.

     

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