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Volume 14 Issue 4
Aug.  2007
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Zuyuan Zhou, Guangchao Chen, Bin Li, Weizhong Tang,  and Fanxiu Lv, Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD, J. Univ. Sci. Technol. Beijing, 14(2007), No. 4, pp. 365-368. https://doi.org/10.1016/S1005-8850(07)60072-3
Cite this article as:
Zuyuan Zhou, Guangchao Chen, Bin Li, Weizhong Tang,  and Fanxiu Lv, Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD, J. Univ. Sci. Technol. Beijing, 14(2007), No. 4, pp. 365-368. https://doi.org/10.1016/S1005-8850(07)60072-3
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Materials

Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

  • 通讯作者:

    Guangchao Chen    E-mail: guangchaochen@mater.ustb.edu.cn

  • Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments (DOE). An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.
  • Materials

    Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

    + Author Affiliations
    • Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments (DOE). An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.
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