Yongping Zhang, Yousong Gu, Xiangrong Chang, Zhongzhuo Tian, Dongxia Shi, Xiufang Zhanga, and Lei Yuan, Carbon Nitride Films Deposited on Pt Substrates by Microwave Plasma Chemical Vapor Deposition, J. Univ. Sci. Technol. Beijing, 7(2000), No. 1, pp. 42-44.
Cite this article as:
Yongping Zhang, Yousong Gu, Xiangrong Chang, Zhongzhuo Tian, Dongxia Shi, Xiufang Zhanga, and Lei Yuan, Carbon Nitride Films Deposited on Pt Substrates by Microwave Plasma Chemical Vapor Deposition, J. Univ. Sci. Technol. Beijing, 7(2000), No. 1, pp. 42-44.
Yongping Zhang, Yousong Gu, Xiangrong Chang, Zhongzhuo Tian, Dongxia Shi, Xiufang Zhanga, and Lei Yuan, Carbon Nitride Films Deposited on Pt Substrates by Microwave Plasma Chemical Vapor Deposition, J. Univ. Sci. Technol. Beijing, 7(2000), No. 1, pp. 42-44.
Citation:
Yongping Zhang, Yousong Gu, Xiangrong Chang, Zhongzhuo Tian, Dongxia Shi, Xiufang Zhanga, and Lei Yuan, Carbon Nitride Films Deposited on Pt Substrates by Microwave Plasma Chemical Vapor Deposition, J. Univ. Sci. Technol. Beijing, 7(2000), No. 1, pp. 42-44.
Material Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China
Beijing Laboratory of Vacuum Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
中文摘要
Carbon nitride thin films have been synthesized on polycrystalline Pt substrates using microwave plasma chemical vapor deposition (MPCVD) technique. The N/C atomic ratio is close to the stoichiometric value 1.33 of C3N4. The experimental X-ray diffraction spectra contain all the strong peaks of α-C3N4 and β-C3N4. The films are a mixture of α-C3N4 and β-C3N4. The observed Raman and FT-IR spectra support the existence of C-N covalent bond in carbon nitride compound. The bulk modulus detected by Nano II nanoindentor is up to 349 GPa.
Carbon nitride thin films have been synthesized on polycrystalline Pt substrates using microwave plasma chemical vapor deposition (MPCVD) technique. The N/C atomic ratio is close to the stoichiometric value 1.33 of C3N4. The experimental X-ray diffraction spectra contain all the strong peaks of α-C3N4 and β-C3N4. The films are a mixture of α-C3N4 and β-C3N4. The observed Raman and FT-IR spectra support the existence of C-N covalent bond in carbon nitride compound. The bulk modulus detected by Nano II nanoindentor is up to 349 GPa.
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