Cite this article as:

WANG Jian-jun, LU Fan-xiu, LIU Ying-kai, YU Wen-xiu, and TONG Yu-mei, EFFECT OF NEGATIVE BIAS ON DIAMOND NUCLEATION IN MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION SYSTEM, J. Univ. Sci. Technol. Beijing , 3(1996), No. 1, pp.12-16.
WANG Jian-jun, LU Fan-xiu, LIU Ying-kai, YU Wen-xiu, and TONG Yu-mei, EFFECT OF NEGATIVE BIAS ON DIAMOND NUCLEATION IN MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION SYSTEM, J. Univ. Sci. Technol. Beijing , 3(1996), No. 1, pp.12-16.
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直流负偏压对金刚石形核的影响

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EFFECT OF NEGATIVE BIAS ON DIAMOND NUCLEATION IN MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION SYSTEM

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