Guanghua Yu, Hongchen Zhao, Jiao Teng, Chunlin Chai, Fengwu Zhu, Yang Xia, and Shumin Chai, XPS Studies of Magnetic Multilayers, J. Univ. Sci. Technol. Beijing, 8(2001), No. 3, pp. 210-213.
Cite this article as:
Guanghua Yu, Hongchen Zhao, Jiao Teng, Chunlin Chai, Fengwu Zhu, Yang Xia, and Shumin Chai, XPS Studies of Magnetic Multilayers, J. Univ. Sci. Technol. Beijing, 8(2001), No. 3, pp. 210-213.
Guanghua Yu, Hongchen Zhao, Jiao Teng, Chunlin Chai, Fengwu Zhu, Yang Xia, and Shumin Chai, XPS Studies of Magnetic Multilayers, J. Univ. Sci. Technol. Beijing, 8(2001), No. 3, pp. 210-213.
Citation:
Guanghua Yu, Hongchen Zhao, Jiao Teng, Chunlin Chai, Fengwu Zhu, Yang Xia, and Shumin Chai, XPS Studies of Magnetic Multilayers, J. Univ. Sci. Technol. Beijing, 8(2001), No. 3, pp. 210-213.
Material Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China
Microelectronics Center, Chinese Academy of Science, Beijing 100029, China
中文摘要
NiOx/Ni81Fe19 and Co/AlOx/Co magnetic multilayers were fabricated by reactive RF/DC magnetron sputtering on clean glass substrates and oxidized Si (100) substrates, respectively. The exchange biasing field (Hex) between NiOx and Ni81Fe19 as a function of NiOx oxidation states was studied by X-ray photoelectron spectroscopy (XPS). The oxidation states and the oxide thickness of Al layers in magnetic multilayer films consisting of Co/AlOx/Co were also analyzed. It is found that the Hex of NiOx/Ni81Fe19 films only depends on Ni2+ but not on Ni3+ or Ni. The bottom Co can be completely covered by depositing an Al layer thicker than 2.0 nm. The oxide layer was Al2O3, and its thickness was 1.15 mn.
NiOx/Ni81Fe19 and Co/AlOx/Co magnetic multilayers were fabricated by reactive RF/DC magnetron sputtering on clean glass substrates and oxidized Si (100) substrates, respectively. The exchange biasing field (Hex) between NiOx and Ni81Fe19 as a function of NiOx oxidation states was studied by X-ray photoelectron spectroscopy (XPS). The oxidation states and the oxide thickness of Al layers in magnetic multilayer films consisting of Co/AlOx/Co were also analyzed. It is found that the Hex of NiOx/Ni81Fe19 films only depends on Ni2+ but not on Ni3+ or Ni. The bottom Co can be completely covered by depositing an Al layer thicker than 2.0 nm. The oxide layer was Al2O3, and its thickness was 1.15 mn.
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