Cite this article as:

MA ZHONGTING, and NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS, J. Univ. Sci. Technol. Beijing , 2(1995), No. 1, pp.44-49.
MA ZHONGTING, and NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS, J. Univ. Sci. Technol. Beijing , 2(1995), No. 1, pp.44-49.
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Ti1－xAlxN PVD薄层的微结构特征和氧化行为

摘要: 本文总结了关于Ti1-xAlxN薄层的微结构特征和氧化行为的最新研究成果。Ti1-xAlxN薄层含有3个不同的相区：x值较小时，其微结构为立方晶系；x值较大时，其微结构为六方晶系；x为中间值时，其结构尚不清楚。应用选择性氧化机理，预测了具有不同Ti/Al比值的Ti1-xAlxN薄层的氧化结果。

 

MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS

Abstract: Recent research on microstructural characteristics and oxidation behavior of Ti1-xAlxN thin film were surveyed. The Ti1-xAlxN coatings have three different phase regions, Bl structure for lower x value, wurtzite structure for higher x value and unidentified structure for medium x value. Based upon the selective oxidation mechanism the oxidation results of Ti1-xAlxN thin film with different Ti/Al ratio were predicated.

 

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