XPS Studies of Chemical States of NiO/NiFe Interface

Guanghua Yu, Chunlin Chai, Fengwu Zhu, Jimei Xiao, Wuyan Lai

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    Guanghua Yu, Chunlin Chai, Fengwu Zhu, Jimei Xiao, and Wuyan Lai, XPS Studies of Chemical States of NiO/NiFe Interface, J. Univ. Sci. Technol. Beijing , 8(2001), No. 4, pp.270-273.
    Guanghua Yu, Chunlin Chai, Fengwu Zhu, Jimei Xiao, and Wuyan Lai, XPS Studies of Chemical States of NiO/NiFe Interface, J. Univ. Sci. Technol. Beijing , 8(2001), No. 4, pp.270-273.
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    XPS Studies of Chemical States of NiO/NiFe Interface

    • Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China

    • Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, China

    基金项目: 

    supported by the National Natural Science Foundation of China (No. 19890310)

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    中文摘要

    Ta/NTiO/NiFe/Ta multilayers were prepared by radio frequency reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 9.6 × 103 A/m. The compositions and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique, The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni + FeO and 3NiO+2Fe =3 Ni+Fe2O3. The thickness of the chemical reaction area estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products appear magnetic defects, and the exchange coupling field Hex and the coereivity Hc of NiO/NiFe are affected by these defects.

     

    Materials

    XPS Studies of Chemical States of NiO/NiFe Interface

    Author Affilications

      • Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China

      • Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, China

    • Funds: 

      supported by the National Natural Science Foundation of China (No. 19890310)

    • Received: 11 February 2001;
    Ta/NTiO/NiFe/Ta multilayers were prepared by radio frequency reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 9.6 × 103 A/m. The compositions and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique, The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni + FeO and 3NiO+2Fe =3 Ni+Fe2O3. The thickness of the chemical reaction area estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products appear magnetic defects, and the exchange coupling field Hex and the coereivity Hc of NiO/NiFe are affected by these defects.

     

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