Yunhan Ling, Changchun Ge, Jiangtao Li, and Xinde Bai, Processing and characterization of B4C/Cu graded composite as plasma facing component for fusion reactors, J. Univ. Sci. Technol. Beijing, 10(2003), No. 1, pp. 39-43.
Cite this article as:
Yunhan Ling, Changchun Ge, Jiangtao Li, and Xinde Bai, Processing and characterization of B4C/Cu graded composite as plasma facing component for fusion reactors, J. Univ. Sci. Technol. Beijing, 10(2003), No. 1, pp. 39-43.
Yunhan Ling, Changchun Ge, Jiangtao Li, and Xinde Bai, Processing and characterization of B4C/Cu graded composite as plasma facing component for fusion reactors, J. Univ. Sci. Technol. Beijing, 10(2003), No. 1, pp. 39-43.
Citation:
Yunhan Ling, Changchun Ge, Jiangtao Li, and Xinde Bai, Processing and characterization of B4C/Cu graded composite as plasma facing component for fusion reactors, J. Univ. Sci. Technol. Beijing, 10(2003), No. 1, pp. 39-43.
A new approach for fabricating B4C/Cu graded composite by rapid self-resistance sintering under ultra-high pressure was presented, by which a near dense B4C/Cu graded composite with a compositional spectrum of 0-100% was successfully fabricated. Plasma relevant performances of sintered B4C/Cu composite were preliminarily characterized, it is found that its chemical sputtering yield is 70% lower than that of SMF800 nuclear graphite under 2.7keV D+ irradiation, and almost no damages after 66 shots of in situ plasma discharge in HL-1 Tokamak facility, which indicates B4C/Cu plasma facing component has a good physical and chemical sputtering resistance performance compared with nuclear graphite.
A new approach for fabricating B4C/Cu graded composite by rapid self-resistance sintering under ultra-high pressure was presented, by which a near dense B4C/Cu graded composite with a compositional spectrum of 0-100% was successfully fabricated. Plasma relevant performances of sintered B4C/Cu composite were preliminarily characterized, it is found that its chemical sputtering yield is 70% lower than that of SMF800 nuclear graphite under 2.7keV D+ irradiation, and almost no damages after 66 shots of in situ plasma discharge in HL-1 Tokamak facility, which indicates B4C/Cu plasma facing component has a good physical and chemical sputtering resistance performance compared with nuclear graphite.
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