Hongchen Zhao, Guanghua Yu, Shizhang Shu, and Hong Si, Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure, J. Univ. Sci. Technol. Beijing, 9(2002), No. 1, pp. 45-47.
Cite this article as:
Hongchen Zhao, Guanghua Yu, Shizhang Shu, and Hong Si, Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure, J. Univ. Sci. Technol. Beijing, 9(2002), No. 1, pp. 45-47.
Hongchen Zhao, Guanghua Yu, Shizhang Shu, and Hong Si, Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure, J. Univ. Sci. Technol. Beijing, 9(2002), No. 1, pp. 45-47.
Citation:
Hongchen Zhao, Guanghua Yu, Shizhang Shu, and Hong Si, Dependence of Magnetic Properties and Microstructure of Ni81Fe19 Film on Base Vacuum and Sputtering Pressure, J. Univ. Sci. Technol. Beijing, 9(2002), No. 1, pp. 45-47.
The Ni81Fe19/Ta films with different NiFe thickness were prepared at different base vacuums and sputtering pressures. The results of magnetic measurement and atomic force microscope (AFM) showed that the films prepared at higher base vacuum and lower sputtering pressure had larger △R/R. The reason should be that higher base vacuum and lower sputtering pressure introduce larger grainsize and lower surface roughness, which will weaken the scattering of electrons, reduce the resistance R, and increase △R/R.
The Ni81Fe19/Ta films with different NiFe thickness were prepared at different base vacuums and sputtering pressures. The results of magnetic measurement and atomic force microscope (AFM) showed that the films prepared at higher base vacuum and lower sputtering pressure had larger △R/R. The reason should be that higher base vacuum and lower sputtering pressure introduce larger grainsize and lower surface roughness, which will weaken the scattering of electrons, reduce the resistance R, and increase △R/R.
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