留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码
Volume 6 Issue 3
Sep.  1999
数据统计

分享

计量
  • 文章访问数:  261
  • HTML全文浏览量:  69
  • PDF下载量:  20
  • 被引次数: 0
Mei Zhang, Zhenxiang Liu, Kan Xie, Xueyan Du,  and Wenchao Li, XPS Study of CeO2/Al2O3 film, J. Univ. Sci. Technol. Beijing, 6(1999), No. 3, pp. 199-200,204.
Cite this article as:
Mei Zhang, Zhenxiang Liu, Kan Xie, Xueyan Du,  and Wenchao Li, XPS Study of CeO2/Al2O3 film, J. Univ. Sci. Technol. Beijing, 6(1999), No. 3, pp. 199-200,204.
引用本文 PDF XML SpringerLink
Materials

XPS Study of CeO2/Al2O3 film

  • The redox capacity of CeO2/Al2O3 thin film which was prepared by sol-gel method has been investigated by X-ray Photoelectron Spectrascopy (XPS). The results showed that the thin film was easier to be reduced and re-oxidized than pure CeO2 powder. The key role played by oxygen vacancies which were created from the interaction between CeO2 and Al,O, was also discussed.
  • Materials

    XPS Study of CeO2/Al2O3 film

    + Author Affiliations

    Catalog


    • /

      返回文章
      返回