Varsha R. Mehto, and R. K. Pandey, Activator-assisted electroless deposition of copper nanostructured films, Int. J. Miner. Metall. Mater., 21(2014), No. 2, pp.196-203. https://dx.doi.org/10.1007/s12613-014-0885-x
Cite this article as: Varsha R. Mehto, and R. K. Pandey, Activator-assisted electroless deposition of copper nanostructured films, Int. J. Miner. Metall. Mater., 21(2014), No. 2, pp.196-203. https://dx.doi.org/10.1007/s12613-014-0885-x

Activator-assisted electroless deposition of copper nanostructured films

  • This paper showed simple and effective synthesis of copper nanoparticles within controlled diameter using direct electroless deposition on glass substrates, following the sensitization and activation steps. Electroless-deposited metals, such as Cu, Co, Ni, and Ag, and their alloys had many advantages in micro- and nanotechnologies. The structural, morphological, and optical properties of copper deposits were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), and UV-Vis spectroscopy. The structural data was further analyzed using the Rietveld refinement program. Structural studies reveal that the deposited copper prefers a (111) orientation. AFM studies suggest the deposited materials form compact, uniform, and nanocrystalline phases with a high tendency to self-organize. The data show that the particle size can be controlled by controlling the activator concentration. The absorption spectra of the as-deposited copper nanoparticles reveal that the plasmonic peak broadens and exhibits a blue shift with decreasing particle size.
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