Wei Shao, Ruixin Ma, and Bin Liu, Fabrication and properties of ZAO powder,sputtering target materials and the related films, J. Univ. Sci. Technol. Beijing, 13(2006), No. 4, pp. 346-349. https://doi.org/10.1016/S1005-8850(06)60071-6
Cite this article as:
Wei Shao, Ruixin Ma, and Bin Liu, Fabrication and properties of ZAO powder,sputtering target materials and the related films, J. Univ. Sci. Technol. Beijing, 13(2006), No. 4, pp. 346-349. https://doi.org/10.1016/S1005-8850(06)60071-6
Wei Shao, Ruixin Ma, and Bin Liu, Fabrication and properties of ZAO powder,sputtering target materials and the related films, J. Univ. Sci. Technol. Beijing, 13(2006), No. 4, pp. 346-349. https://doi.org/10.1016/S1005-8850(06)60071-6
Citation:
Wei Shao, Ruixin Ma, and Bin Liu, Fabrication and properties of ZAO powder,sputtering target materials and the related films, J. Univ. Sci. Technol. Beijing, 13(2006), No. 4, pp. 346-349. https://doi.org/10.1016/S1005-8850(06)60071-6
Aluminum-doped zinc oxide (ZnO:Al), abbreviated as ZAO, is a novel and widely used transparent conductive material. The ZAO powder was synthesized by chemical coprecipitation. The ZAO ceramic sputtering target materials were fabricated by sintering in air, and ZAO transparent conductive films were prepared by RF magnetron sputtering on glass substrates. XRD proved that such films had an orientation of (002) crystal panel paralleled to the surface of the glass substrate. The average transmittance of the films in the visible region exceeded 80%.