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MA ZHONGTING, and NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS, J. Univ. Sci. Technol. Beijing , 2(1995), No. 1, pp.44-49.
Cite this article as: MA ZHONGTING, and NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS, J. Univ. Sci. Technol. Beijing , 2(1995), No. 1, pp.44-49.
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MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS

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  • Recent research on microstructural characteristics and oxidation behavior of Ti1-xAlxN thin film were surveyed. The Ti1-xAlxN coatings have three different phase regions, Bl structure for lower x value, wurtzite structure for higher x value and unidentified structure for medium x value. Based upon the selective oxidation mechanism the oxidation results of Ti1-xAlxN thin film with different Ti/Al ratio were predicated.
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