MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi<sub>1-x</sub>Al<sub>x</sub>N PVD-COATINGS

MA ZHONGTING; NI RUIMING

Volume 2 Issue 1

Mar. 1995

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Article Navigation > International Journal of Minerals, Metallurgy and Materials > 1995 > 2(1): 44-49

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

Cite this article as:

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi1-xAlxN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

Citation:

MA ZHONGTINGand NI RUIMING, MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS, J. Univ. Sci. Technol. Beijing, 2(1995), No. 1, pp. 44-49.

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MICROSTRUCTURAL CHARACTERISTICSAND OXIDATION BEHAVIOR OFTi_1-xAl_xN PVD-COATINGS

MA ZHONGTING and
NI RUIMING

+ Author Affiliations

Received: 6 October 1994

Abstract

Abstract

Recent research on microstructural characteristics and oxidation behavior of Ti_1-xAl_xN thin film were surveyed. The Ti_1-xAl_xN coatings have three different phase regions, Bl structure for lower x value, wurtzite structure for higher x value and unidentified structure for medium x value. Based upon the selective oxidation mechanism the oxidation results of Ti_1-xAl_xN thin film with different Ti/Al ratio were predicated.
- crystal system;
- oxidation/TiAlN coatings;
- microstructural characteristic